Fabrication and modal analysis of ion-implanted LiNbO3 ridge optical waveguide for integrated Erbium-doped amplifiers

The technological process, based on ion implantation and selective etching, for producing ridge waveguides on Lithium Niobate substrates is described and successfully applied. The parameters of the fabricated samples are used in a comprehensive FEM-based modal analysis of an Erbium-doped Lithium Niobate ridge waveguide. Simulation results support the concept of strong mode confinement at pump wavelength (980 nm) and single mode operation at signal (1550 nm) wavelength.