An industrial method for low-temperature synthesis of large-area films of molybdenum trioxide microbelts and their field emission property

The synthesis and the growth mechanism of MoO
3
nanostructures have been investigated [1–9]. However, it remains a challenge to develop an industrial approach to prepare a large-area film of MoO
3
nanostructures in a control manner. Such a film may be used to construct flat-panel displays, photoelectrochromic “smart” window etc. Many synthesis methods reported so far require vacuum conditions and/or high growth temperature. In the present work, we explore the possibility of using a commercial infrared sintering furnace for growth of large-area films of MoO
3
microbelts in air and on ITO glass or silicon substrate at low temperature without catalyst. The present result is especially relevant to field emission devices or smart windows because of the glass substrate and the low growth temperature. Our new approach may be very important to the development of a low-cost nano-emitter field emission flat panel display and other large-area devices.