A precision dose control circuit for vertically aligned carbon nanofiber based maskless lithography

This paper presents a precision control circuit for the emission of desired number of electrons from vertically aligned carbon nanofibers (VACNFs) for the realization of a massively parallel maskless e-beam lithography system.The digitally addressable field emission arrays (DAFEAs) of the VACNFs function as the lithography heads for massively parallel e-beam exposure of resist eliminating the cost of photomasks.