Study of a Novel ITO/AZO/SiO2/p-Si SIS Heterojunction

ITO/AZO double films were deposited by RF sputtering on p-Si(lOO) substrate to fabricate ITO/AZO/SiCVp-Si SIS heterojunction. The structural, optics and electrical properties of the ITO/AZO films were characterized by UV-VIS spectrophotometer, four point probe and Hall effect measurement, respectively. The results show that ITO/AZO films have good quality. The electrical junction properties were investigated by I-V measurement, which reveals that the heterojunction shows typical good rectifying behavior and great photoelectric effect.