Simulation study of a capacitively coupled plasma by two dimensional fluid model

Summary form only given. In this study, we present a rigorous 2-D mathematical model for the analysis of plasma density, ion density, and electron temperature in a capacitively coupled plasma under different operating conditions. The model is based on the solutions of conservation equations of mass, momentum, species, and electrostatic field obtained in a fully integrated finite-volume solver using CFDRC. The calculation results show that the plasma density profile has a maximum value between the anode and the cathode and that high-energy electrons are scattered on the cathode wall. The plasma density increases with pressure because of an increase in the electron collision frequency, and the argon in density distribution increases with flow rate. The high ion density at the center of the chamber is because of the additional ionization caused by bombardment with the high-energy electrons. With an increase in the chamber pressure, the ions move toward the outlet; this is because of a decrease in mean free path and temperature of the electrons. The 2D fluid model can be used to obtain additional information about the inter-electrode distance. It is found that the plasma densities at both the electrodes show a nonuniform profile with an increase in the inter-electrode distance. This nonuniformity is expected to affect the uniformity of the deposited layer.