Filling of slot waveguides with Atomic Layer Deposition

Slot waveguides are promising new nanostructures for confining light in low-index materials. Atomic layer deposition (ALD) could be a very suitable method to fill vertical slot waveguides with inorganic materials. Intel has the ALD technology already in production in its new high-k silicon technology, so it would be a natural choice for enabling the integration of photonic components on the same chips.