Electromagnetic near field distribution measurements using optically scanning system

An optically scanning electromagnetic field probe system, consisting of an electro-optic or magneto-optic crystal substrate and a galvano scanner, has been developed for the high speed, low-invasive measurement of electromagnetic near field distribution. We present some examples of electromagnetic field distribution measurements above a microstrip line using a LiNbO
₃
or a magnetic garnet crystal substrate and the probe system. We have also measured electromagnetic fields above a commercially available IC using the system.