Microstructure and magnetic properties of ACD Co-P thin films for magnetic recording

An electrochemical method, based on the measurement of transient voltages after short square current pulses, is proposed to control the chemical deposition of Co-P thin films for magnetic recording. By this method it has been possible to show the importance of H/sub 2/ or O/sub 2/ saturation in the bath on the process, mainly at the nucleation stage. Co-P films of different structure are obtained from several solutions and, after different pretreatments, their role is stressed. The relations between the deposit structure and its magnetic properties are pointed out.<
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