Etched facet semiconductor resonators fabricated by reactive ion beam etching for micro-photonic integrated circuits

Summary form only given. Monolithic integration of semiconductor photonic devices is one of key issues for future lightwave networks. Size reduction of photonic devices including semiconductor lasers is important for large scale integration. In this work, we have developed semiconductor micro-fabrication processes to realize miniature photonic devices such as micro-ring lasers and tiny corner reflectors. The design and the characterization on etched facet resonators fabricated by reactive ion beam etching (RIBE) will be presented. We use the total internal reflection at the interface between semiconductors and air to confine the lightwave in the miniature photonic devices. For this purpose, we have fabricated some etched facet resonators.