A Novel Capacitance-Match Method for EAS Responder

A novel manufacture technology in regard to EAS responder of conductive ink was introduced. According to its operating principle, running characteristics of recovery and puncturing responder were analyzed as well as a calculation for parasitic and tuning capacitance. In addition, a new match technology was provided for retrievable parasitic capacitance. Also, the capacitance structure of the response flat and the puncturing mechanism were studied connected with alarge number of data, which provided a manufacture method for the puncturing responder based on this excellent match.