Test structure for characterizing metal thickness in damascene CMP technology

In the damascene processed tracks, the electrical extraction of the metal thickness is reached through a complex analysis. This is due to processing defects such as dishing and erosion, and linewidths decreasing. This work introduces a new test structure, coupled with the temperature coefficient of resistance (TCR) method in Warkusz, F., et al, (1978). This allows an accurate characterization of metal thickness. At the same time, parameters such as sheet resistance and resistivity become easier to extract for statistical processing analysis.