Rapid characterization of parametric distributions using a multi-meter

We present a technique for fast characterization of the statistical mean and sigma of parametric variations. The technique uses a scan chain to sequentially cycle through a device array, creating a periodic waveform that can be directly measured using a multi-meter. The DC and RMS values of the waveform directly give the mean and sigma of the parameter distribution. We show the technique is sufficiently general and can be applied to wide range of characterization strategies. A V
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characterization array was implemented in a 65 nm bulk CMOS process where we compare traditional individual device measurements for calculating statistics with the direct mean and sigma measurement technique using the multi-meter.