Novel Application of Programmed Defects to Enhance 200/300mm SEM Navigation Accuracy During 65nm MirrorBit Development

The backbone of in-line defect characterization is a combination of sensitive inspection recipes and accurate high resolution review imaging using a scanning electron microscope (SEM). One of the most challenging aspects of in-line defect metrology is successfully linking the data output from the inspection tool to the SEM tool. Programmed defects have been a widely used tool in the industry to help verify inspection recipe sensitivity. This paper will explore expanding the role of programmed defects to enable accurate SEM imaging by providing reliable coordinate offsets between the inspection tool and the SEM tool.