A Novel Projection Exposure System Using a Gradient-Index Lens Array

A novel projection exposure system using a gradient-index lens array was proposed, and the patterning characteristics were investigated. The guaranteed MTF value of the Gradient-index lens array was 70% for 6 line pairs/mm, and the lens array was usually used for patterns with sizes of more than 50- 100 μm in the other applications. However, obtained partial resolution of 2.5 μm was greatly higher, and the imaging capability appears sufficient for printing the required patterns with sizes of sub-10 μm. The new method was feasible though the light intensity inequality should be improved.