4E-4 Propagation Characteristics of SH-SAW in (1120) ZnO Layer/Silica Glass Substrate Structures

A (1120) textured ZnO film can excite SH-SAW. Therefore, the film on various substrates is an attractive option for fabricating the SH-SAW device on a silicon IC, and the device on a curved surface. In this report, the electromechanical coupling coefficients (K¹) in the ZnO (0deg, 90deg, psi) film/silica glass substrate structures were theoretically estimated. The theoretical results showed that the IDT electrode/ZnO (0deg, 90deg, 55deg) film/silica glass substrate structure had a relatively large K² value of 3.4 % at H/lambda=0.21. This structure was then fabricated using RF magnetron sputtering technique. The experimental results clearly demonstrated SH-SAW excitation in the structure.