Si Micro Probe and SiO2 Micro Tube Array Integrated with nMOSFETs

This paper describes a device design, fabrication, experimental results, and mechanical strength for a multi functional device of neural behavioral analysis. The device has been fabricated with Si micro probe of 2μm in diameter and SiO
₂
micro tube of 3.6μm in outer diameter on circuit of MOSFETs, using standard IC process followed by a selective VLS growth and MEMS techniques. MOSFETs' performance on Si(lll) is 150mV/decade of subthreshold factor and 1.2V of threshold voltage after the fabrication process of probes and tubes. Penetration experiment into the gelatin was carried out for an application of neural recording devices.