FUSI Specific Yield Monitoring Enabling Improved Circuit Performance and Fast Feedback to Production

The integration of fully silicided gates on a high-k dielectric in a standard process flow offers a solid alternative to the conventional Poly/SiON devices. In this work, we provide an extensive analysis of the module yield extracted for such devices highlighting the need for specific additional alarm flags without which some integration problems might be overlooked. The impact at the circuit level is studied and supported by modeling work on simple ring-oscillators.