Omnidirectional Reflection of Light Waves On Si/SiO2 Multilayer Films

We have investigated the reflection of electromagnetic waves on the Si/SiO
₂
multilayer films. The film is fabricated by magnetron sputtering technique. For all polarizations of incident light, reflectance measurements demonstrate a wide omnidirectional photonic band gap. The resonant modes within the photonic band gap are observed at the telecommunication wavelengths. The experimental results are in good agreement with numerical simulations. The feature of this type of film achieves the potential applications in wavelength division multiplexing devices.