CMOS membrane infrared sensors and improved TMAHW etchant

We report the design and fabrication of thermoelectric infrared sensors realized using industrial CMOS IC technologies combined with a subsequent anisotropic etching step. Back etched two-element sensors together with on-chip low-noise operational amplifiers for an intrusion alarm are presented. The etch characteristics of an improved TMAHW (tetramethyl ammonium-hydroxide water) etching solution which could be used instead of KOH are also described.<
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