Low-frequency noise behavior of Si NMOSTs stressed at 4.2 K

The low-frequency (LF) noise behavior of Si NMOSTs stressed at 4.2 K is investigated and compared with the stress-induced changes in the DC parameters. In linear operation, a reduction of the noise spectral density is observed, which can be explained by considering the reduction in the device transconductance. The excess noise, typically observed in the kink region, is reduced after stress, as is the noise hysteresis. This behaviour can be understood by substituting the changes in the substrate current characteristic in the excess-noise model derived.<
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