Fabrication techniques for thin film applications of high temperature superconductors

The authors consider the technological difficulties to be faced in developing a suitable fabrication process for devices based on high temperature superconductors. They do not discuss here the various HTS deposition techniques (e.g. evaporation, sputtering, MBE or laser ablation) since each of these, under optimum conditions, is capable of producing films of high quality. Instead they concentrate on the characteristics of these films which are crucial to the development of a multilayer fabrication process (particularly for Josephson tunnel junction devices), and on the lithographic requirements peculiar to these materials.<
>