Optical field concentration in low-index waveguides

We present a highly efficient optical field concentrator that is capable of confining optical field in nanometer-thin low-index media with very high optical confinement factor. The structure is made of multiple-layered low-index nanolayers embedded in high-index silicon waveguides. By creating multiple high-index-contrast interfaces, the normal field in the low-index nanolayer regions is significantly enhanced. It subsequently results in a very high optical confinement and power density in these regions. With the help of numerical simulation tools, the guiding and propagating characteristics of the new structure are studied and presented. The optimal structures have demonstrated confinement factors and normalized power densities in the range of 30%-60% and 20-160 /spl mu/m/sup -2/ for the 5-20-nm thin low-index multiple nanolayers.