Overview of X-ray lithography at IBM using a compact storage ring

Feasibility studies being conducted of the use of X-ray lithography for the production of high-density silicon chips are discussed. The system approach to X-ray lithography adopted considers the interaction of all the components-X-ray source, masks, resists, and exposure tools-with the devices and processes. In particular, the status of the Advanced Lithography Facility which houses the electron storage ring X-ray source is presented.<
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