Examination of dimer formation on Si(001) by Monte Carlo simulation

Investigation of dimers influence on surface relief during annealing and deposition processes were carried out using Monte Carlo simulation. A new program package SilSim3D-7comp taking into account covalent bonds dimerization on the surface of diamond-like crystals was developed. Dimers formation on [001] and (105) surfaces was analyzed. Dimers were demonstrated to be responsible for surface relief stabilization.