Carrier lifetime of low-temperature-grown In/sub 0.53/Ga/sub 0.47/As on GaAs using an InGaAlAs metamorphic buffer

Dependence of carrier lifetime of low-temperature-grown In/sub 0.53/Ga/sub 0.47/As (LT-InGaAs) on GaAs using an InGaAlAs metamorphic buffer (M-buffer) on post-growth rapid thermal annealing was investigated. Utilization of residual dislocation in the LT-InGaAs on the M-buffer was effective in reducing the carrier lifetime, producing the carrier lifetime of 2.14 ps that is comparable to that of the Be-doped LT-InGaAs.