Application of perfluorocarbon liquids for a-C:F film production on electrodes by plasma enhanced chemical vapor deposition

Application of dielectric liquids for production of thin films on substrates was presented. In our studies, taking a perfluorooctane C/sub 8/F/sub 18/ monomer liquid, an amorphous fluorocarbon thin film (a-C:F) was deposited on substrates in radio-frequency C/sub 8/F/sub 18/ vapor plasma. The decomposed species in the plasma were observed as C, C/sub 2/, CF, CF/sub 2/ and CF/sub 3/. The chemical and electrical properties of a-C:F films were examined. The breakdown voltage (V/sub s/) of N/sub 2/, Ar and He gases between the a-C:F film coated Al sphere-sphere electrodes for a gas pressure (p) times gap length (d), 0.1-100 Torr cm, was measured. It was found that the a-C:F film coated electrodes enhanced V/sub s/ values by a several times higher than the Al electrode case.