Large grain poly-Si thin films by metal induced crystallization of a-Si:H

Large grain poly-Si thin films on glass substrates have been successfully fabricated. The film thickness was 400 nm and the grains sizes were in excess of several microns. The films were fabricated using aluminum-induced crystallization of a-Si:H in the presence of a silicon oxide layer at the AI/a-Si:H interface. The a-Si:H film was deposited on glass substrates and the annealing temperatures and annealing times were kept below 450 /spl deg/C and 30 minutes, respectively. The resulting poly-Si was heavily Al-doped.