New technique for measurement of electron saturation velocity in GaAs MESFET's

A new technique for the measurement of the electron saturation velocity in GaAs FET's is proposed using the "end" resistance measurement. The measurements performed on 1.3-µm gate-length ion-implanted GaAs MESFET's lead to the values of the saturation velocity ranging from 1 to 1.3 × 10
⁵
m/s.