Silicon-based waveguide materials for integrated optics

In this work we present results of Si/SiO/sub 2//SiON/SiO/sub 2/ waveguides fabricated by means of ECR-PECVD. In order to change refraction index and simultaneously to reduce losses related with hydrogen, we have used N/sub 2/ as precursor gas for controlling the nitrogen to oxygen relation. The composition of the samples were carefully controlled by RBS and ERDA analysis. In this paper we also present results of channel waveguides fabricated on silicon oxynitride material by using infrared femtosecond laser pulses. This approach is based on Si/SiO/sub 2//SiON/SiO/sub 2/ planar waveguides previously fabricated and show low propagation losses.