Fabrication and optical property of two-dimensional infrared photonic crystals by deep reactive ion etching in Si

We report the fabrication and characterization of two-dimensional silicon-based photonic crystal structures realized by deep reactive ion etching method. Photonic crystals of square and triangular lattices with very high aspect ratios up to 33 have been achieved. Photonic bandgap behaviors are identified by the transmission and reflection spectra measured by using a Fourier transform infrared spectrometer. The experiment results are in good agreement with calculated band structures.