Wavelength-selective components in SOI photonic wires fabricated with deep UV lithography

We demonstrate both ring resonator drop filters and arrayed waveguide gratings in silicon-on-insulator photonic wires. The structures are fabricated in a CMOS line using deep UV lithography and dry etching processes. Waveguide losses are as low as 2.4 dB/cm for a 500 nm wide photonic wire, with excess bend losses of 0.03 dB/90/spl deg/ in a 3 /spl mu/m bend. Using grating fiber couplers for measurements, we show ring and racetrack resonators with a Q up to 12700 and an 8-channel arrayed waveguide grating with a footprint of about 0.1 mm/sup 2/, 3 nm channel spacing and -6 dB crosstalk between channels.