Calculation of shape anisotropy for micropatterned thin Fe-Ni films for on-chip RF applications

We present a self-consistent calculation of the effective anisotropy of patterned, integrated ferromagnetic films. For comparison, experimental data were obtained from electroplated thin (0.5 /spl mu/m) Ni-Fe films with different patterns. The effective anisotropy of patterned samples was increased by shape demagnetizing effects from just 10 Oe up to 100 Oe. The samples with suitable characteristics were subsequently used as cores for on-chip inductors and microstrips.