Progress in understanding of laser-produced plasmas for EUV source

Our research aims at the physical understanding of laser-produced plasma (LPP) as an EUV source for lithography. To provide a database of EUV source this comprehensive research includes high performance laser development, target fabrication, plasma experiments, theory and simulations. We will report present progress of each subject, particularly recent experimental results of Sn and SnO/sub 2/ targets and comparison with computer simulations.