Characterization of Si-CeO/sub 2/-YBCO tri-layers grown by magnetron sputtering

Material aspects of heterostructural Si/CeO/sub 2/, fabricated by magnetron sputtering as buffered substrates for sputtered YBa/sub 2/Cu/sub 3/O/sub 7-x/ (YBCO) films, are studied by means of X-ray diffraction, AFM, Raman and SIMS-ToF analysis. Different Si/CeO/sub 2/ layouts are chosen and tri-layers Si/CeO/sub 2//YBCO, grown on the respective bi-layer substrates, are preliminary analyzed. Outstanding material issues suggest that in the framework of sputtering technology, epitaxy is out of reach for Si/CeO/sub 2//YBCO multi-layers. However, the results point toward the scalability/integrability of the technology with silicon processing when the main target consists of networking for integrated electronics.