Development of nitrogen-doped cobalt silicide film as the hinge material of a micromirror

The characteristics of hinge play an important role in the reliability and lifetime of a torsional micromirror. It is the purpose of this research to develop tough hinge material. To this purpose, nitrogen-doped cobalt silicide film (CoSi/sub x/N/sub y/) is sputtered from CoSi/sub 2/ target in Ar/N/sub 2/ discharge. Stress and sheet resistance of the CoSi/sub x/N/sub y/ film are evaluated.