Fabrication of nano/microstructures in SiO/sub 2/ and TiO/sub 2/ by swift ions

The authors introduce work on 2D and 3D nano/microfabrication with MeV ion beam irradiation on a-SiO/sub 2/ and rutile single crystal TiO/sub 2/. The electronic stopping of the ions is responsible for the track formation. The latent tracks atomic structure and enhanced etch rate are identified.