Simultaneous UV direct writing of channel waveguides and Bragg gratings in germanium-doped planar silica

Channel waveguides incorporating photo-imprinted Bragg gratings were produced in germano-borosilicate glass layers fabricated by flame hydrolysis deposition, through single- and double-step exposure direct writing processes with UV laser irradiation. To our knowledge, this is the first time that UV exposure has been used to simultaneously realize both waveguiding and spectral selectivity functions.