Local Hot-Spot Quench Analysis on Parallel-Wound No-Insulation High Temperature Superconductor Coil for a Single Silicon Crystal Growth System

The demand for high-quality silicon wafers with larger diameters has been heightened due to the fast growth of semiconductor integrated circuit industry. High temperature superconductor (HTS) magnet is capable of generating high static magnetic field at high operating temperature, which plays a crucial role in improving the quality of single silicon crystal during its growth process. Parallel-wound no-insulation (PWNI) HTS coil, wound with parallel-stacked HTS tapes, has the advantages of low inductance, fast ramping rate and enhanced thermal stability. These characteristics give PWNI coil broad application prospect in high-quality silicon wafers production. The simulation model demonstrates that the quench characteristics of PWNI coil differ from those of single-wound no-insulation (SWNI) coil, which is wound using a single tape, due to current redistribution among the stacked tapes. However, experimental data on this topic remains insufficient. This study aims at experimentally investigating and analyzing the local hot-spot quench characteristics of PWNI HTS coil. In this study, voltage taps and Hall sensors are used to monitor the variations in voltage and magnetic field during the local hot-spot quench process of PWNI and SWNI coils. The experimental result confirms that, PWNI coil exhibits superior magnetic field generation capability compared to SWNI coil during the charging process. During the quench process, the PWNI coil exhibits larger voltage perturbations and smaller fluctuations in its central magnetic field compared to the SWNI coil. This study provides data support for understanding the local hot-spot quench properties of PWNI HTS coil, offering reference for its application and design as high-field magnet in advanced technological systems.