Physical vacuum co-deposition (PVco-D) method for various thin film materials

The article presents a method of producing thin-film materials using the PVco-D (Physical Vapor Co-Deposition) method. The proposed technique allows for obtaining high uniformity and repeatable thin films and producing hybrid organic and inorganic materials in a single vacuum vapor deposition process. To carry out the process, it is necessary to use a high vacuum to provide conditions for the sublimation of components, thermal insulation of independent sources, and an appropriate free path. The described method allowed us to obtain thin layers of hybrid perovskites and transparent conducting materials, which can be used to construct photovoltaic cells. The obtained layers' basic physical and optical parameters and examples of their applications were presented.