Generation of High-Energy Laser Pulses at 266 nm with Sub-Nanosecond Pulse Duration and 20 Hz Repetition Rate

High-energy and high-peak-power UV lasers have gained attention recently due to their suitability for microfabrication. We developed a high-energy laser system using a microchip laser with a sub-nanosecond pulse duration and power amplifiers employing Distributed Faced Cooling [1], achieving pulse energies exceeding 2 J at a repetition rate of20 Hz. This report presents the results of wavelength conversion based on this laser, achieving 266 nm in the Deep UV (DUV) range.