Silicide Technology for Metal/Semiconductor Contact on ULSI and Nanoelectronics Applications

Silicide is one of the most important materials on the silicon (Si) ultra-large scale integrated circuits (ULSI) technology [1], [2]. Silicide is a kind of compounds with Si and metal, and usually used for metal/semiconductor (MS) contact in Si ULSIs. The research and development on the formation technology of MS contact and the control of their electronic properties are ones of the most essential parts to establish the applications of Si ULSIs and group-IV semiconductors nanoelectronics.