Photolithography in Microfabrication: Analysis and Application in PN Junction Diode Fabrication

With the development of integrated circuits (ICs), higher requirement for precision during the fabrication process of electronic component means more advanced methods must be applied. Therefore, this paper proposes to explore the working principle and application of photolithography in microfabrication, which is an edging technology commonly used in today's IC design. In the article, the common process of photolithography and the corresponding function of each step will be explained in detail. After that, the application of this method in real PN-junction diode fabrication will be illustrated with experimental equipment and parameters introduced. The electric property of the diodes was tested to sketch the I-V curve in the final step and the result turned out that the whole process was reliable because the product showed obvious property of PNjunction. The content in this article can act as a reference in other applications of photolithography and it is suggested that the experiment can be replicated to explore the fabrication of other electronic components.