I. Introduction
The micro-nano step height measurement is a critical aspect of high-precision manufacturing, essential for the development and quality control of various advanced technologies in industries, such as MEMS, microelectronics, and photovoltaic cells, where the accuracy of micro and nanoscale features directly impacts the performance and reliability of the final products. Different instruments and methods have been developed for micro-nano step height measurement, such as scanning probe microscope, scanning electron microscope, and stylus profilometer [1]. As compared with these instruments, optical interferometry shows its features of relative low cost and easy operation while maintaining good precision in engineering applications.