Evaluation of Mems Getter Performance Based on The Surface Roughness and Atomic-Level Simulation Thereof

This work proposes a method of using the surface roughness to evaluate the getter fabrication quality in MEMS devices. The LAMMPS atomic-level simulation is used to optimize the process conditions of the deposit, which provides a method to reduce the surface roughness and obtain getter film with smaller grains. SEM, AFM and TGA experiments verify the reliability of the simulation and show a good linear relationship between the grain size and roughness. Consequently, the assessment of surface roughness utilizing AFM can serve as a reliable indicator of the sorption capabilities of the MEMS getter material.