A Case Study on Sputtered Chromium Sacrificial Layer for Ti2O3 Microstructure Fabrication

In this study, Ti2O3 microstructures were successfully fabricated using chromium (Cr) thin films as a sacrificial layer. The process is straightforward and can be monitored using an optical microscope. Atomic Force Microscopy confirmed the structures, with the Ti2O3 thin film thickness determined to be 26 nm. In situ High-resolution X-ray Photoelectron Spectroscopy was performed, confirming the synthesis of Ti2O3 thin films by reactive laser ablation and revealing spontaneous surface oxidation, resulting in a complex surface structure: TiO2 on top, TiO as an intermediate interface, and bulk Ti2O3 beneath. The high chemical selectivity of Cr sacrificial layers ensured successful microfabrication without damaging the Ti2O3. These findings highlight the importance of surface phenomena in Ti2O3 for micro-electronic device fabrication.