Design and Realization of RF Voltage and Current Monitoring System

This paper designs a voltage-current measurement system that can be used to measure the voltage-current power and load impedance on the transmission line during semiconductor plasma etching. The system couples the mainline signals through a voltage-current monitor and processes them, and the corresponding information can be solved by calculator software. The device can realize a voltage coupling ratio of $\mathbf{- 6 0} \mathrm{dB}$ and a current coupling ratio of $\mathbf{- 5 0} \mathbf{d B}$. The overall system size is 148 mm $\times 96 \mathrm{~mm} \times 50 \mathrm{~mm}$.