AlGaInP double heterostructure visible-light laser diodes with a GaInP active layer grown by metalorganic vapor phase epitaxy

AlGaInP double heterostructure laser diodes with a GaInP active layer constitute a basic laser structure for visible-light lasers using an AlGaInP alloy system. This paper gives a detailed description of (Al
x
Ga
1-x
)
0.5
In
0.5
P metalorganic vapor phase epitaxial growth, laser-fabrication processes, and basic device-characteristics for these lasers. The obtained pulsed-threshold-current was about 3.8 kA/cm
²
(3.2 kA/cm
²
minimum) for laser diodes with an
8-10 \mu
m wide and
150-300 \mu
m long injection stripe. High characteristic-temperature T
0
for the temperature dependence of pulsed threshold current was obtained and was found to be dependent on band-gap-energy differences between active layers and cladding layers. The maximum value for T
0
was 222 K. The lasing wavelength of an AlGaInP double heterostructure laser diode with a GaInP active layer was found to depend on growth conditions and dopant behavior during the growth, and it varied in a range from 664 to 690 nm, while the GaInP active layers were lattice-matched to GaAs substrates. This lasing wavelength difference caused by a crystal growth-condition difference, including a dopant effect, can be explained by the Ga
0.5
In
0.5
P band-gap-energy difference due to the crystal structure difference of Ga
0.5
In
0.5
P. Lasing operations (3-5 mW) over 2000 h at room temperature without significant degradation were obtained, demonstrating the highly promising nature of visible-light laser diodes using an AlGaInP alloy system.