Micro optical E-field sensor for intense electric field measurement

In order to meet the requirements of wide-range and wide-area measurement of voltage in power systems, the integration and miniaturization of electric field sensors have become a major trend. Optical electric field sensors have the advantages of high sensitivity, high immunity and wide frequency response range. With the improvement of thin-film lithium niobate (TFLN) etching technology, we propose a micro optical electric field sensor based on a TFLN waveguide structure with the advantages of small size, high linearity and large dynamic range. The sensor achieves intense electric field measurements of more than $100 \mathrm{kV} / \mathrm{m}$. The dynamic range can reach more than 86 dB.