Iron films sputter-deposited by utilizing Ar gas flow

A modified sputtering method allowed a considerable high rate deposition of Fe films and could also produce films which consisted of an assembly of small spherical shape particles. In this sputtering, Fe atoms sputtered in the inside of a hollow type of Fe target were pushed out by flowing Ar gas and deposited on the substrate placed in front of the target. This mechanism enabled sputter-deposition of films in high pressure Ar atmosphere. The films consisted of particles with hard magnetic properties, By changing substrate temperature, the coercive force of 1000 Å- 3000 Å thick films could be controlled up to a maximum of 650 Oe.