Intermediate-Pressure O2 RFCCP:Different Power and pressure

Radio frequency (RF) capacitively coupled plasma (CCP) sources are of great relevance due to their numerous industrial applications[1]. However, previous research has focused on pressures below 1 Torr, due to the difficulty of common diagnostics at higher pressures. We have measured oxygen atom densities and temperatures by cavity ringdown spectroscopy (CRDS) at 630nm[2], combined with electrical measurements of the plasma impedance and ion fluxes in O
2
plasmas over the pressure range 1-6 Torr and 100-650W RF power at 13.56 MHz.